Material passport
Ta · Tantalum target
Tantalum targets for semiconductor barrier layers and related thin-film processes.
Industries: Semiconductor
Material specification summary. Purity, dimensions, test methods, packaging and supply scope are subject to technical agreement.
Specifications
Key specifications
A specification summary for preliminary selection.
| Item | Value |
|---|---|
| Material | Ta / Tantalum target |
| Purity | 4N |
| Process | Powder metallurgy / Melting and casting |
| Configuration | Planar |
| Industries | Semiconductor |
Process
Manufacturing chain
Different materials use different process combinations.
Applications
Applications and related materials
Move from application back to material, then into adjacent options.
- Barrier layers
- Semiconductor films
- Interconnect processes
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Documents and validation
Make material parameters verifiable
The material page shows a specification summary. A formal project also needs inspection items, report scope and sputter evaluation. Download a catalog or contact our technical team.
- Elemental analysis: ICP, XRF, LECO, GDMS
- Microstructure: SEM, XRD, metallography
- Dimensions and bonding: ultrasonic, helium leak, CMM
- Thin-film and sputter evaluation
Send us the grade and film target
We will review feasibility across purity, process, configuration and inspection.